SIMPL-2 (Simulated Profiles from the Layout - Version 2)

Keunmyung Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M85/55
July 1985

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/ERL-85-55.pdf

SIMPL is a computer-aided design (CAD) tool for simulating the cross sectional profile of integrated circuits along an arbitrary 'cut-line' drawn on the layout. The second generation of SIMPL, SIMPL-2 is capable of displaying in color two-dimensional process effects such as the 'bird's-beak' lateral diffusion, undercut in etching and sidewall coverage in deposition, based on its linked-polygonal and grid type databases.

The device profile from the composite process can be generated rapidly using elementary internal physical process models. More rigorous external process simulators can also be invoked through an interface for profile data and transfer of control. An external process simulator, SAMPLE, is successfully linked to SIMPL-2 for the deposition process. As of now. the other processes are done by internal routines. However, these modules are easily detachable and the other external simulators can be linked for more rigorous simulation. SIMPL-2 thus acts not only a s a color display tool for other simulators but also provides a here-to-fore missing link between layout based CAD tools and process and device simulators.

For the graphics interface. SIMPL-2 uses a device-independent graphics package, MFB (Model Frame Buffer). The color and pattern information for each layer of layout and cross section is stored in a readable file and can be modified.

SIMPL-2 consists of about 12,500 lines of C codes excluding MFB and the external process simulator. Currently, SIMPL-2 runs on a VAX11/780 with Berkeley UNIX 4.2BSD.

Advisor: Andrew R. Neureuther

BibTeX citation:

@phdthesis{Lee:M85/55,
    Author = {Lee, Keunmyung},
    Title = {SIMPL-2 (Simulated Profiles from the Layout - Version 2)},
    School = {EECS Department, University of California, Berkeley},
    Year = {1985},
    Month = {Jul},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/531.html},
    Number = {UCB/ERL M85/55},
    Abstract = {SIMPL is a computer-aided design (CAD) tool for simulating the 
cross sectional profile of integrated circuits along an arbitrary
'cut-line' drawn on the layout.  The second generation of SIMPL,
SIMPL-2 is capable of displaying in color two-dimensional process
effects such as the 'bird's-beak' lateral diffusion, undercut
in etching and sidewall coverage in deposition, based on its
linked-polygonal and grid type databases.

The device profile from the composite process can be generated
rapidly using elementary internal physical process models.  More
rigorous external process simulators can also be invoked through an
interface for profile data and transfer of control.  An external 
process simulator, SAMPLE, is successfully linked to SIMPL-2 for
the deposition process.  As of now. the other processes are done by
internal routines.  However, these modules are easily detachable
and the other external simulators can be linked for more rigorous
simulation.  SIMPL-2 thus acts not only a s a color display tool
for other simulators but also provides a here-to-fore missing link
between layout based CAD tools and process and device simulators.

For the graphics interface. SIMPL-2 uses a device-independent
graphics package, MFB (Model Frame Buffer).  The color and 
pattern information for each layer of layout and cross section
is stored in a readable file and can be modified.

SIMPL-2 consists of about 12,500 lines of C codes excluding 
MFB and the external process simulator.  Currently,
SIMPL-2 runs on a VAX11/780 with Berkeley UNIX 4.2BSD.}
}

EndNote citation:

%0 Thesis
%A Lee, Keunmyung
%T SIMPL-2 (Simulated Profiles from the Layout - Version 2)
%I EECS Department, University of California, Berkeley
%D 1985
%@ UCB/ERL M85/55
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/531.html
%F Lee:M85/55