Deep Sub-Micron Photolithography Control Through In-Line Metrology

Nickhil H. Jakatdar

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/11
January 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-11.pdf

Advisor: Costas J. Spanos


BibTeX citation:

@phdthesis{Jakatdar:M00/11,
    Author = {Jakatdar, Nickhil H.},
    Title = {Deep Sub-Micron Photolithography Control Through In-Line Metrology},
    School = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html},
    Number = {UCB/ERL M00/11}
}

EndNote citation:

%0 Thesis
%A Jakatdar, Nickhil H.
%T Deep Sub-Micron Photolithography Control Through In-Line Metrology
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/11
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3817.html
%F Jakatdar:M00/11