Sang Hun Lee
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/63
December 2000
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-63.pdf
Advisor: Jeffrey Bokor
BibTeX citation:
@phdthesis{Lee:M00/63, Author = {Lee, Sang Hun}, Title = {Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications}, School = {EECS Department, University of California, Berkeley}, Year = {2000}, Month = {Dec}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html}, Number = {UCB/ERL M00/63} }
EndNote citation:
%0 Thesis %A Lee, Sang Hun %T Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications %I EECS Department, University of California, Berkeley %D 2000 %@ UCB/ERL M00/63 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html %F Lee:M00/63