An Optical Metrology System for Lithography Process Monitoring and Control

Junwei Bao

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/2
January 2003

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-03-2.pdf

Advisor: Costas J. Spanos

BibTeX citation:

@phdthesis{Bao:M03/2,
    Author = {Bao, Junwei},
    Title = {An Optical Metrology System for Lithography Process Monitoring and Control},
    School = {EECS Department, University of California, Berkeley},
    Year = {2003},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html},
    Number = {UCB/ERL M03/2}
}

EndNote citation:

%0 Thesis
%A Bao, Junwei
%T An Optical Metrology System for Lithography Process Monitoring and Control
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/2
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html
%F Bao:M03/2