John L. Reynolds

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M83/78

, 1983

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/ERL-m-83-78.pdf

Advisors: Andrew R. Neureuther and William G. Oldham

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BibTeX citation:

@phdthesis{Reynolds:M83/78,
    Author= {Reynolds, John L.},
    Title= {Characterization of Plasma Etched Structures in IC Processing},
    School= {EECS Department, University of California, Berkeley},
    Year= {1983},
    Month= {Jun},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
    Number= {UCB/ERL M83/78},
}

EndNote citation:

%0 Thesis
%A Reynolds, John L. 
%T Characterization of Plasma Etched Structures in IC Processing
%I EECS Department, University of California, Berkeley
%D 1983
%@ UCB/ERL M83/78
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html
%F Reynolds:M83/78