Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times

R.A. Stewart and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/14
February 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-14.pdf

BibTeX citation:

@techreport{Stewart:M91/14,
    Author = {Stewart, R.A. and Lieberman, Michael A.},
    Title = {Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    Month = {Feb},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1702.html},
    Number = {UCB/ERL M91/14}
}

EndNote citation:

%0 Report
%A Stewart, R.A.
%A Lieberman, Michael A.
%T Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/14
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1702.html
%F Stewart:M91/14