Plasma Etching of CVD Tungsten Using ECR Discharges

C. Lee, D.W. Hess and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/92
October 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-92.pdf

BibTeX citation:

@techreport{Lee:M91/92,
    Author = {Lee, C. and Hess, D.W. and Lieberman, Michael A.},
    Title = {Plasma Etching of CVD Tungsten Using ECR Discharges},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    Month = {Oct},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html},
    Number = {UCB/ERL M91/92}
}

EndNote citation:

%0 Report
%A Lee, C.
%A Hess, D.W.
%A Lieberman, Michael A.
%T Plasma Etching of CVD Tungsten Using ECR Discharges
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/92
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html
%F Lee:M91/92