B. Lynch and S. Das and Michael A. Lieberman and D.W. Hess

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M92/25

, 1992

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/ERL-92-25.pdf

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BibTeX citation:

@techreport{Lynch:M92/25,
    Author= {Lynch, B. and Das, S. and Lieberman, Michael A. and Hess, D.W.},
    Title= {Electron Cyclotron Resonance Etching of Silylated Photoresist},
    Year= {1992},
    Month= {Mar},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html},
    Number= {UCB/ERL M92/25},
}

EndNote citation:

%0 Report
%A Lynch, B. 
%A Das, S. 
%A Lieberman, Michael A. 
%A Hess, D.W. 
%T Electron Cyclotron Resonance Etching of Silylated Photoresist
%I EECS Department, University of California, Berkeley
%D 1992
%@ UCB/ERL M92/25
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html
%F Lynch:M92/25