Catalog Description: Introduction to partially ionized, chemically reactive plasmas, including collisional processes, diffusion, sources, sheaths, boundaries, and diagnostics. DC, RF, and microwave discharges. Applications to plasma-assisted materials processing and to plasma wall interactions.

Units: 3

Prerequisites: An upper division course in electromagnetics or fluid dynamics.

Formats:
Spring: 3 hours of lecture per week
Fall: 3 hours of lecture per week

Grading basis: letter

Final exam status: Written final exam conducted during the scheduled final exam period

Also listed as: AST C239

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Related Areas:

• Physical Electronics (PHY)