Direct Measurement of the Depletion Layer Width Variation vs. Applied Bias for a Pin Junction

N.C. MacDonald and T.E. Everhart

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M130

1965

This publication is archived. It is kept only for reference purposes, so it is no longer being updated and may not meet accessibility standards. If you need this content in a different format, please email webteam@eecs.berkeley.edu.

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1965/Archive/ERL-m-130.pdf

BibTeX citation:

@techreport{MacDonald:M130,
    Author= {MacDonald, N.C. and Everhart, T.E.},
    Title= {Direct Measurement of the Depletion Layer Width Variation vs. Applied Bias for a Pin Junction},
    Year= {1965},
    Month= {Oct},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1965/28385.html},
    Number= {UCB/ERL M130},
}

EndNote citation:

%0 Report
%A MacDonald, N.C. 
%A Everhart, T.E. 
%T Direct Measurement of the Depletion Layer Width Variation vs. Applied Bias for a Pin Junction
%I EECS Department, University of California, Berkeley
%D 1965
%@ UCB/ERL M130
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1965/28385.html
%F MacDonald:M130