Report on the Design of a Simulator Program (SAMPLE) for IC Fabrication

Sharad Narayan Nandgaonkar

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M79/16

1978

This publication is archived. It is kept only for reference purposes, so it is no longer being updated and may not meet accessibility standards. If you need this content in a different format, please email webteam@eecs.berkeley.edu.

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1978/Archive/ERL-m-79-16.pdf

In the fabrication of Integrated Circuits a major step is to etch out a particular geometric pattern from a mask onto a semiconductor wafer. This report describes the present state of an user-oriented simulation program (SAMPLE), developed at UCB, to aid in this process as a whole.

The program is based on a model of the process, closely parallelling the real one, as a sequence of operations performed on the photoresist coated wafer by various machines. An user-interface allows the user to interact with these simulated machines and processes using some simple input statements. The overall design and implementation details of the user-interface and the simulated lab are presented, along with the information for using it.

BibTeX citation:

@techreport{Nandgaonkar:M79/16,
    Author= {Nandgaonkar, Sharad Narayan},
    Title= {Report on the Design of a Simulator Program (SAMPLE) for IC Fabrication},
    Year= {1978},
    Month= {Jun},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1978/9606.html},
    Number= {UCB/ERL M79/16},
    Abstract= {In the fabrication of Integrated Circuits a major step is to etch
out a particular geometric pattern from a mask onto a semiconductor
wafer.  This report describes the present state of an user-oriented
simulation program (SAMPLE), developed at UCB, to aid in this
process as a whole.

The program is based on a model of the process, closely parallelling
the real one, as a sequence of operations performed on the
photoresist coated wafer by various machines.  An user-interface
allows the user to interact with these simulated machines and
processes using some simple input statements.  The overall design
and implementation details of the user-interface and the simulated
lab are presented, along with the information for using it.},
}

EndNote citation:

%0 Report
%A Nandgaonkar, Sharad Narayan 
%T Report on the Design of a Simulator Program (SAMPLE) for IC Fabrication
%I EECS Department, University of California, Berkeley
%D 1978
%@ UCB/ERL M79/16
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1978/9606.html
%F Nandgaonkar:M79/16