Simulation of Developed Resist Profiles for Electron-Beam Lithography

Michael G. Rosenfield

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M81/40

1981

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/Archive/ERL-m-81-40.pdf

A program for the simulation of the time evolution of two dimensional electron-beam exposed resist profiles is presented. The implementation of an electron-beam machine in the user oriented computer program for the Simulation and Modeling of Profiles in Lithography and Etching (SAMPLE) is discussed. Complete software documentation as well as a study of new electron-beam writing strategies and resist development effects are included.

Advisors: Andrew R. Neureuther

BibTeX citation:

@mastersthesis{Rosenfield:M81/40,
    Author= {Rosenfield, Michael G.},
    Title= {Simulation of Developed Resist Profiles for Electron-Beam Lithography},
    School= {EECS Department, University of California, Berkeley},
    Year= {1981},
    Month= {Jun},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/9612.html},
    Number= {UCB/ERL M81/40},
    Abstract= {A program for the simulation of the time evolution of two
dimensional electron-beam exposed resist profiles is presented.
The implementation of an electron-beam machine in the user oriented
computer program for the Simulation and Modeling of Profiles in
Lithography and Etching (SAMPLE) is discussed.  Complete software
documentation as well as a study of new electron-beam writing
strategies and resist development effects are included.},
}

EndNote citation:

%0 Thesis
%A Rosenfield, Michael G. 
%T Simulation of Developed Resist Profiles for Electron-Beam Lithography
%I EECS Department, University of California, Berkeley
%D 1981
%@ UCB/ERL M81/40
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/9612.html
%F Rosenfield:M81/40