John L. Reynolds
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M83/78
June 1983
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/ERL-m-83-78.pdf
Advisor: Andrew R. Neureuther and William G. Oldham
BibTeX citation:
@phdthesis{Reynolds:M83/78, Author = {Reynolds, John L.}, Title = {Characterization of Plasma Etched Structures in IC Processing}, School = {EECS Department, University of California, Berkeley}, Year = {1983}, Month = {Jun}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html}, Number = {UCB/ERL M83/78} }
EndNote citation:
%0 Thesis %A Reynolds, John L. %T Characterization of Plasma Etched Structures in IC Processing %I EECS Department, University of California, Berkeley %D 1983 %@ UCB/ERL M83/78 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html %F Reynolds:M83/78