Characterization of Plasma Etched Structures in IC Processing

John L. Reynolds

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M83/78

1983

This publication is archived. It is kept only for reference purposes, so it is no longer being updated and may not meet accessibility standards. If you need this content in a different format, please email webteam@eecs.berkeley.edu.

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/Archive/ERL-m-83-78.pdf

Advisors: Andrew R. Neureuther and William G. Oldham

BibTeX citation:

@phdthesis{Reynolds:M83/78,
    Author= {Reynolds, John L.},
    Title= {Characterization of Plasma Etched Structures in IC Processing},
    School= {EECS Department, University of California, Berkeley},
    Year= {1983},
    Month= {Jun},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
    Number= {UCB/ERL M83/78},
}

EndNote citation:

%0 Thesis
%A Reynolds, John L. 
%T Characterization of Plasma Etched Structures in IC Processing
%I EECS Department, University of California, Berkeley
%D 1983
%@ UCB/ERL M83/78
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html
%F Reynolds:M83/78