Characterization of Plasma Etched Structures in IC Processing
John L. Reynolds
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M83/78
1983
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/ERL-m-83-78.pdf
Advisors: Andrew R. Neureuther and William G. Oldham
BibTeX citation:
@phdthesis{Reynolds:M83/78,
Author= {Reynolds, John L.},
Title= {Characterization of Plasma Etched Structures in IC Processing},
School= {EECS Department, University of California, Berkeley},
Year= {1983},
Month= {Jun},
Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
Number= {UCB/ERL M83/78},
}
EndNote citation:
%0 Thesis %A Reynolds, John L. %T Characterization of Plasma Etched Structures in IC Processing %I EECS Department, University of California, Berkeley %D 1983 %@ UCB/ERL M83/78 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html %F Reynolds:M83/78