P.R. Deshmukh

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M84/69

, 1984

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/ERL-m-84-69.pdf

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BibTeX citation:

@techreport{Deshmukh:M84/69,
    Author= {Deshmukh, P.R.},
    Title= {Proximity Exposure Studies in Electron Beam Lithography},
    Year= {1984},
    Month= {Sep},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html},
    Number= {UCB/ERL M84/69},
}

EndNote citation:

%0 Report
%A Deshmukh, P.R. 
%T Proximity Exposure Studies in Electron Beam Lithography
%I EECS Department, University of California, Berkeley
%D 1984
%@ UCB/ERL M84/69
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html
%F Deshmukh:M84/69