Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)
G.M. Atkinson
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M85/51
, 1985
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/ERL-85-51.pdf
BibTeX citation:
@techreport{Atkinson:M85/51, Author= {Atkinson, G.M.}, Title= {Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)}, Year= {1985}, Month= {Jun}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html}, Number= {UCB/ERL M85/51}, }
EndNote citation:
%0 Report %A Atkinson, G.M. %T Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL) %I EECS Department, University of California, Berkeley %D 1985 %@ UCB/ERL M85/51 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html %F Atkinson:M85/51