Characterization of Ion Implanted and Annealed GaAs for an Integrated Circuit Process

J.E. Van Leeuwen

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M86/17
February 1986

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/ERL-86-17.pdf


BibTeX citation:

@techreport{Van Leeuwen:M86/17,
    Author = {Van Leeuwen, J.E.},
    Title = {Characterization of Ion Implanted and Annealed GaAs for an Integrated Circuit Process},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1986},
    Month = {Feb},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/655.html},
    Number = {UCB/ERL M86/17}
}

EndNote citation:

%0 Report
%A Van Leeuwen, J.E.
%T Characterization of Ion Implanted and Annealed GaAs for an Integrated Circuit Process
%I EECS Department, University of California, Berkeley
%D 1986
%@ UCB/ERL M86/17
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/655.html
%F Van Leeuwen:M86/17