Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process
R. Alley and P.K. Ko and K. Voros
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M86/75
, 1986
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/ERL-86-75.pdf
BibTeX citation:
@techreport{Alley:M86/75, Author= {Alley, R. and Ko, P.K. and Voros, K.}, Title= {Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process}, Year= {1986}, Month= {Sep}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/753.html}, Number= {UCB/ERL M86/75}, }
EndNote citation:
%0 Report %A Alley, R. %A Ko, P.K. %A Voros, K. %T Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process %I EECS Department, University of California, Berkeley %D 1986 %@ UCB/ERL M86/75 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/753.html %F Alley:M86/75