Printability of Defects in Optical Lithography: Polarity and Critical Location Effects

V. Mastromarco

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M87/40
June 1987

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/ERL-87-40.pdf

BibTeX citation:

@techreport{Mastromarco:M87/40,
    Author = {Mastromarco, V.},
    Title = {Printability of Defects in Optical Lithography: Polarity and Critical Location Effects},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1987},
    Month = {Jun},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/900.html},
    Number = {UCB/ERL M87/40}
}

EndNote citation:

%0 Report
%A Mastromarco, V.
%T Printability of Defects in Optical Lithography: Polarity and Critical Location Effects
%I EECS Department, University of California, Berkeley
%D 1987
%@ UCB/ERL M87/40
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/900.html
%F Mastromarco:M87/40