Printability of Defects in Optical Lithography: Polarity and Critical Location Effects
V. Mastromarco
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M87/40
, 1987
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/ERL-87-40.pdf
BibTeX citation:
@techreport{Mastromarco:M87/40, Author= {Mastromarco, V.}, Title= {Printability of Defects in Optical Lithography: Polarity and Critical Location Effects}, Year= {1987}, Month= {Jun}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/900.html}, Number= {UCB/ERL M87/40}, }
EndNote citation:
%0 Report %A Mastromarco, V. %T Printability of Defects in Optical Lithography: Polarity and Critical Location Effects %I EECS Department, University of California, Berkeley %D 1987 %@ UCB/ERL M87/40 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1987/900.html %F Mastromarco:M87/40