I.L. Wemple

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M88/12

, 1988

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-12.pdf

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BibTeX citation:

@techreport{Wemple:M88/12,
    Author= {Wemple, I.L.},
    Title= {Single-Step Processes for Etching TaSi_2/ Polysilicon Gate Structures in SF_6/CCl_xF_y Plasmas},
    Year= {1988},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1006.html},
    Number= {UCB/ERL M88/12},
}

EndNote citation:

%0 Report
%A Wemple, I.L. 
%T Single-Step Processes for Etching TaSi_2/ Polysilicon Gate Structures in SF_6/CCl_xF_y Plasmas
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/12
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1006.html
%F Wemple:M88/12