Single-Step Processes for Etching TaSi_2/ Polysilicon Gate Structures in SF_6/CCl_xF_y Plasmas

I.L. Wemple

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M88/12
January 1988

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-12.pdf

BibTeX citation:

@techreport{Wemple:M88/12,
    Author = {Wemple, I.L.},
    Title = {Single-Step Processes for Etching TaSi_2/ Polysilicon Gate Structures in SF_6/CCl_xF_y Plasmas},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1988},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1006.html},
    Number = {UCB/ERL M88/12}
}

EndNote citation:

%0 Report
%A Wemple, I.L.
%T Single-Step Processes for Etching TaSi_2/ Polysilicon Gate Structures in SF_6/CCl_xF_y Plasmas
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/12
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1006.html
%F Wemple:M88/12