B. Huynh
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M88/36
May 1988
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-36.pdf
BibTeX citation:
@techreport{Huynh:M88/36, Author = {Huynh, B.}, Title = {Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography}, Institution = {EECS Department, University of California, Berkeley}, Year = {1988}, Month = {May}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html}, Number = {UCB/ERL M88/36} }
EndNote citation:
%0 Report %A Huynh, B. %T Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography %I EECS Department, University of California, Berkeley %D 1988 %@ UCB/ERL M88/36 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html %F Huynh:M88/36