B. Huynh

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M88/36

, 1988

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-36.pdf

---

BibTeX citation:

@techreport{Huynh:M88/36,
    Author= {Huynh, B.},
    Title= {Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography},
    Year= {1988},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html},
    Number= {UCB/ERL M88/36},
}

EndNote citation:

%0 Report
%A Huynh, B. 
%T Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/36
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html
%F Huynh:M88/36