Andrew R. Neureuther and William G. Oldham and R.C. Anderson and D.M. Drako and W.E. Haller and B. Huynh and D.E. Lyons and G.R. Misium and D.P. Sutija and K.K.H. Toh and B. Uathavikul

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M88/39

, 1988

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-39.pdf

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BibTeX citation:

@techreport{Neureuther:M88/39,
    Author= {Neureuther, Andrew R. and Oldham, William G. and Anderson, R.C. and Drako, D.M. and Haller, W.E. and Huynh, B. and Lyons, D.E. and Misium, G.R. and Sutija, D.P. and Toh, K.K.H. and Uathavikul, B.},
    Title= {Test Structures for the Electrical Characterization of Optical Lithography},
    Year= {1988},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1056.html},
    Number= {UCB/ERL M88/39},
}

EndNote citation:

%0 Report
%A Neureuther, Andrew R. 
%A Oldham, William G. 
%A Anderson, R.C. 
%A Drako, D.M. 
%A Haller, W.E. 
%A Huynh, B. 
%A Lyons, D.E. 
%A Misium, G.R. 
%A Sutija, D.P. 
%A Toh, K.K.H. 
%A Uathavikul, B. 
%T Test Structures for the Electrical Characterization of Optical Lithography
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/39
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1056.html
%F Neureuther:M88/39