An Integrated Graphical Environment for Operating IC Process Simulators

A.S. Wong

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M89/67
May 1989

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-67.pdf

This report describes PROSE (PROcess Simulation Environment), an integrated environment for operating integrated-circuit process simulators. PROSE features a graphical user interface for displaying and editing layout and cross-sectional structures, interactive menus and dialog boxes for invoking simulation tools and entering process parameters, and a Profile Interchange Format for specifying device structure information. This environment is based on the VEM/OCT/RPC CAD system, and uses a new process manager named SIMPL-RPC (SIMulated Profiles from the Layout, Remote Procedure Call).

Special attention has been placed on the development of the Profile Interchange Format (PIF). A parser has been implemented in SIMPL-RPC for reading and writing ASCII PIF files. SIMPL-RPC also has the ability to store and manipulate binary PIF data in the OCT database with a new library of data access functions and a policy which defines how PIF data is stored in OCT.

BibTeX citation:

@techreport{Wong:M89/67,
    Author = {Wong, A.S.},
    Title = {An Integrated Graphical Environment for Operating IC Process Simulators},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1989},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1252.html},
    Number = {UCB/ERL M89/67},
    Abstract = {This report describes PROSE (PROcess Simulation Environment),
an integrated environment for operating integrated-circuit process
simulators.  PROSE features a graphical user interface for displaying
and editing layout and cross-sectional structures, interactive
menus and dialog boxes for invoking simulation tools and entering
process parameters, and a Profile Interchange Format for specifying
device structure information. This environment is based on the
VEM/OCT/RPC CAD system, and uses a new process manager named
SIMPL-RPC (SIMulated Profiles from the Layout, Remote Procedure
Call).

Special attention has been placed on the development of the Profile
Interchange Format (PIF). A parser has been implemented in SIMPL-RPC
for reading and writing ASCII PIF files. SIMPL-RPC also has the
ability to store and manipulate binary PIF data in the OCT database
with a new library of data access functions and a policy which
defines how PIF data is stored in OCT.}
}

EndNote citation:

%0 Report
%A Wong, A.S.
%T An Integrated Graphical Environment for Operating IC Process Simulators
%I EECS Department, University of California, Berkeley
%D 1989
%@ UCB/ERL M89/67
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1252.html
%F Wong:M89/67