Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography
W.N. Partlo
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M89/68
, 1989
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-68.pdf
BibTeX citation:
@techreport{Partlo:M89/68, Author= {Partlo, W.N.}, Title= {Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography}, Year= {1989}, Month= {May}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1253.html}, Number= {UCB/ERL M89/68}, }
EndNote citation:
%0 Report %A Partlo, W.N. %T Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography %I EECS Department, University of California, Berkeley %D 1989 %@ UCB/ERL M89/68 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1253.html %F Partlo:M89/68