D.A. Carl and D.W. Hess and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M89/98

, 1989

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-98.pdf

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BibTeX citation:

@techreport{Carl:M89/98,
    Author= {Carl, D.A. and Hess, D.W. and Lieberman, Michael A.},
    Title= {Oxidation of Silicon in an ECR Oxygen Plasma: Kinetics, Physico-Chemical and Electrical Properties},
    Year= {1989},
    Month= {Aug},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1305.html},
    Number= {UCB/ERL M89/98},
}

EndNote citation:

%0 Report
%A Carl, D.A. 
%A Hess, D.W. 
%A Lieberman, Michael A. 
%T Oxidation of Silicon in an ECR Oxygen Plasma: Kinetics, Physico-Chemical and Electrical Properties
%I EECS Department, University of California, Berkeley
%D 1989
%@ UCB/ERL M89/98
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1305.html
%F Carl:M89/98