Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing

Michael A. Lieberman and Nathan W. Cheung

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/26
April 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-26.pdf

BibTeX citation:

@techreport{Lieberman:M91/26,
    Author = {Lieberman, Michael A. and Cheung, Nathan W.},
    Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    Month = {Apr},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html},
    Number = {UCB/ERL M91/26}
}

EndNote citation:

%0 Report
%A Lieberman, Michael A.
%A Cheung, Nathan W.
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/26
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html
%F Lieberman:M91/26