Michael A. Lieberman and Nathan W. Cheung

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M91/26

, 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-26.pdf

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BibTeX citation:

@techreport{Lieberman:M91/26,
    Author= {Lieberman, Michael A. and Cheung, Nathan W.},
    Title= {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing},
    Year= {1991},
    Month= {Apr},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html},
    Number= {UCB/ERL M91/26},
}

EndNote citation:

%0 Report
%A Lieberman, Michael A. 
%A Cheung, Nathan W. 
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/26
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html
%F Lieberman:M91/26