Real-Time Statistical Process Control for Plasma Etching

H-F. Guo

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/61
July 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-61.pdf

BibTeX citation:

@techreport{Guo:M91/61,
    Author = {Guo, H-F.},
    Title = {Real-Time Statistical Process Control for Plasma Etching},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    Month = {Jul},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html},
    Number = {UCB/ERL M91/61}
}

EndNote citation:

%0 Report
%A Guo, H-F.
%T Real-Time Statistical Process Control for Plasma Etching
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/61
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html
%F Guo:M91/61