H-F. Guo

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M91/61

, 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-61.pdf

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BibTeX citation:

@techreport{Guo:M91/61,
    Author= {Guo, H-F.},
    Title= {Real-Time Statistical Process Control for Plasma Etching},
    Year= {1991},
    Month= {Jul},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html},
    Number= {UCB/ERL M91/61},
}

EndNote citation:

%0 Report
%A Guo, H-F. 
%T Real-Time Statistical Process Control for Plasma Etching
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/61
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html
%F Guo:M91/61