Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation
K.H. Tadros
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M91/72
, 1991
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-72.pdf
BibTeX citation:
@techreport{Tadros:M91/72, Author= {Tadros, K.H.}, Title= {Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation}, Year= {1991}, Month= {Aug}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html}, Number= {UCB/ERL M91/72}, }
EndNote citation:
%0 Report %A Tadros, K.H. %T Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/72 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html %F Tadros:M91/72