Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation

K.H. Tadros

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/72
August 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-72.pdf

BibTeX citation:

@techreport{Tadros:M91/72,
    Author = {Tadros, K.H.},
    Title = {Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    Month = {Aug},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html},
    Number = {UCB/ERL M91/72}
}

EndNote citation:

%0 Report
%A Tadros, K.H.
%T Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/72
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html
%F Tadros:M91/72