Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report
Nathan W. Cheung and Michael A. Lieberman and C.A. Pico and R.A. Stewart and J. Tao and M.H. Kiang and C. Yu and V. Vahedi and B. Troyanovsky and W. En and E. Jones and J. Benasso
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M91/86
, 1991
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-86.pdf
BibTeX citation:
@techreport{Cheung:M91/86, Author= {Cheung, Nathan W. and Lieberman, Michael A. and Pico, C.A. and Stewart, R.A. and Tao, J. and Kiang, M.H. and Yu, C. and Vahedi, V. and Troyanovsky, B. and En, W. and Jones, E. and Benasso, J.}, Title= {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report}, Year= {1991}, Month= {Jun}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1822.html}, Number= {UCB/ERL M91/86}, }
EndNote citation:
%0 Report %A Cheung, Nathan W. %A Lieberman, Michael A. %A Pico, C.A. %A Stewart, R.A. %A Tao, J. %A Kiang, M.H. %A Yu, C. %A Vahedi, V. %A Troyanovsky, B. %A En, W. %A Jones, E. %A Benasso, J. %T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/86 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1822.html %F Cheung:M91/86