C. Lee and D.W. Hess and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M91/92

, 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-92.pdf

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BibTeX citation:

@techreport{Lee:M91/92,
    Author= {Lee, C. and Hess, D.W. and Lieberman, Michael A.},
    Title= {Plasma Etching of CVD Tungsten Using ECR Discharges},
    Year= {1991},
    Month= {Oct},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html},
    Number= {UCB/ERL M91/92},
}

EndNote citation:

%0 Report
%A Lee, C. 
%A Hess, D.W. 
%A Lieberman, Michael A. 
%T Plasma Etching of CVD Tungsten Using ECR Discharges
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/92
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html
%F Lee:M91/92