Nathan W. Cheung and Michael A. Lieberman and C.A. Pico and R.A. Stewart and J. Tao and M.H. Kiang and C. Yu and V. Vahedi and B. Troyanovsky and W. En and E. Jones and J. Benasso

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M91/116

, 1991

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-116.pdf

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BibTeX citation:

@techreport{Cheung:M91/116,
    Author= {Cheung, Nathan W. and Lieberman, Michael A. and Pico, C.A. and Stewart, R.A. and Tao, J. and Kiang, M.H. and Yu, C. and Vahedi, V. and Troyanovsky, B. and En, W. and Jones, E. and Benasso, J.},
    Title= {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report},
    Year= {1991},
    Month= {Sep},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html},
    Number= {UCB/ERL M91/116},
}

EndNote citation:

%0 Report
%A Cheung, Nathan W. 
%A Lieberman, Michael A. 
%A Pico, C.A. 
%A Stewart, R.A. 
%A Tao, J. 
%A Kiang, M.H. 
%A Yu, C. 
%A Vahedi, V. 
%A Troyanovsky, B. 
%A En, W. 
%A Jones, E. 
%A Benasso, J. 
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/116
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html
%F Cheung:M91/116