Issues in Deep-UV Lithography Using Pulsed Laser Light Sources
William N. Partlo
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M92/14
, 1992
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/ERL-92-14.pdf
Advisors: William G. Oldham
BibTeX citation:
@phdthesis{Partlo:M92/14, Author= {Partlo, William N.}, Title= {Issues in Deep-UV Lithography Using Pulsed Laser Light Sources}, School= {EECS Department, University of California, Berkeley}, Year= {1992}, Month= {Jan}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1954.html}, Number= {UCB/ERL M92/14}, }
EndNote citation:
%0 Thesis %A Partlo, William N. %T Issues in Deep-UV Lithography Using Pulsed Laser Light Sources %I EECS Department, University of California, Berkeley %D 1992 %@ UCB/ERL M92/14 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1954.html %F Partlo:M92/14