Issues in Deep-UV Lithography Using Pulsed Laser Light Sources

William N. Partlo

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M92/14
January 1992

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/ERL-92-14.pdf

Advisor: William G. Oldham

BibTeX citation:

@phdthesis{Partlo:M92/14,
    Author = {Partlo, William N.},
    Title = {Issues in Deep-UV Lithography Using Pulsed Laser Light Sources},
    School = {EECS Department, University of California, Berkeley},
    Year = {1992},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1954.html},
    Number = {UCB/ERL M92/14}
}

EndNote citation:

%0 Thesis
%A Partlo, William N.
%T Issues in Deep-UV Lithography Using Pulsed Laser Light Sources
%I EECS Department, University of California, Berkeley
%D 1992
%@ UCB/ERL M92/14
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1954.html
%F Partlo:M92/14