B. Lynch, S. Das, Michael A. Lieberman and D.W. Hess
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M92/25
March 1992
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/ERL-92-25.pdf
BibTeX citation:
@techreport{Lynch:M92/25, Author = {Lynch, B. and Das, S. and Lieberman, Michael A. and Hess, D.W.}, Title = {Electron Cyclotron Resonance Etching of Silylated Photoresist}, Institution = {EECS Department, University of California, Berkeley}, Year = {1992}, Month = {Mar}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html}, Number = {UCB/ERL M92/25} }
EndNote citation:
%0 Report %A Lynch, B. %A Das, S. %A Lieberman, Michael A. %A Hess, D.W. %T Electron Cyclotron Resonance Etching of Silylated Photoresist %I EECS Department, University of California, Berkeley %D 1992 %@ UCB/ERL M92/25 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html %F Lynch:M92/25