Issues in Deep-UV Photoresist Technology: Characterization and Modeling of Bulk and Surface Imaged Resists for 248 and 213 nm Lithography
John M. Hutchinson
EECS Department, University of California, Berkeley
1994
Advisors: William G. Oldham
BibTeX citation:
@phdthesis{Hutchinson:7914, Author= {Hutchinson, John M.}, Title= {Issues in Deep-UV Photoresist Technology: Characterization and Modeling of Bulk and Surface Imaged Resists for 248 and 213 nm Lithography}, School= {EECS Department, University of California, Berkeley}, Year= {1994}, }
EndNote citation:
%0 Thesis %A Hutchinson, John M. %T Issues in Deep-UV Photoresist Technology: Characterization and Modeling of Bulk and Surface Imaged Resists for 248 and 213 nm Lithography %I EECS Department, University of California, Berkeley %D 1994 %F Hutchinson:7914