Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge

C. Lee, D.B. Graves and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M95/9
January 1995

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/ERL-95-9.pdf


BibTeX citation:

@techreport{Lee:M95/9,
    Author = {Lee, C. and Graves, D.B. and Lieberman, Michael A.},
    Title = {Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1995},
    Month = {Jan},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html},
    Number = {UCB/ERL M95/9}
}

EndNote citation:

%0 Report
%A Lee, C.
%A Graves, D.B.
%A Lieberman, Michael A.
%T Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge
%I EECS Department, University of California, Berkeley
%D 1995
%@ UCB/ERL M95/9
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html
%F Lee:M95/9