Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge

C. Lee and D.B. Graves and Michael A. Lieberman

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M95/9

1995

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/Archive/ERL-95-9.pdf

BibTeX citation:

@techreport{Lee:M95/9,
    Author= {Lee, C. and Graves, D.B. and Lieberman, Michael A.},
    Title= {Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge},
    Year= {1995},
    Month= {Jan},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html},
    Number= {UCB/ERL M95/9},
}

EndNote citation:

%0 Report
%A Lee, C. 
%A Graves, D.B. 
%A Lieberman, Michael A. 
%T Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge
%I EECS Department, University of California, Berkeley
%D 1995
%@ UCB/ERL M95/9
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html
%F Lee:M95/9