Photoresist Dissolution Mechanism Studies

A.M. Zenk

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/30
May 1996

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-30.pdf

BibTeX citation:

@techreport{Zenk:M96/30,
    Author = {Zenk, A.M.},
    Title = {Photoresist Dissolution Mechanism Studies},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1996},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html},
    Number = {UCB/ERL M96/30}
}

EndNote citation:

%0 Report
%A Zenk, A.M.
%T Photoresist Dissolution Mechanism Studies
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/30
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html
%F Zenk:M96/30