Photoresist Dissolution Mechanism Studies
A.M. Zenk
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M96/30
, 1996
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-30.pdf
BibTeX citation:
@techreport{Zenk:M96/30, Author= {Zenk, A.M.}, Title= {Photoresist Dissolution Mechanism Studies}, Year= {1996}, Month= {May}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html}, Number= {UCB/ERL M96/30}, }
EndNote citation:
%0 Report %A Zenk, A.M. %T Photoresist Dissolution Mechanism Studies %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/30 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html %F Zenk:M96/30