Photoresist Dissolution Mechanism Studies

A.M. Zenk

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M96/30

1996

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/Archive/ERL-96-30.pdf

BibTeX citation:

@techreport{Zenk:M96/30,
    Author= {Zenk, A.M.},
    Title= {Photoresist Dissolution Mechanism Studies},
    Year= {1996},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html},
    Number= {UCB/ERL M96/30},
}

EndNote citation:

%0 Report
%A Zenk, A.M. 
%T Photoresist Dissolution Mechanism Studies
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/30
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3021.html
%F Zenk:M96/30