William G. En

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M96/35

1996

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-35.pdf

Advisors: Nathan W. Cheung

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BibTeX citation:

@phdthesis{En:M96/35,
    Author= {En, William G.},
    Title= {Oxide Charging Damage in Integrated Circuit Processing Investigated with a Coupled Plasma/IC Device Model},
    School= {EECS Department, University of California, Berkeley},
    Year= {1996},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3034.html},
    Number= {UCB/ERL M96/35},
}

EndNote citation:

%0 Thesis
%A En, William G. 
%T Oxide Charging Damage in Integrated Circuit Processing Investigated with a Coupled Plasma/IC Device Model
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/35
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3034.html
%F En:M96/35