Erin C. Jones

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M96/36

, 1996

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-36.pdf

Advisors: Nathan W. Cheung

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BibTeX citation:

@phdthesis{Jones:M96/36,
    Author= {Jones, Erin C.},
    Title= {Ultra-Shallow Junction Fabrication Using Plasma Immersion Ion Implantation and Epitaxial Cobalt Disilicide as a Dopant Source},
    School= {EECS Department, University of California, Berkeley},
    Year= {1996},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3035.html},
    Number= {UCB/ERL M96/36},
}

EndNote citation:

%0 Thesis
%A Jones, Erin C. 
%T Ultra-Shallow Junction Fabrication Using Plasma Immersion Ion Implantation and Epitaxial Cobalt Disilicide as a Dopant Source
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/36
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3035.html
%F Jones:M96/36