The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source
M. Wessels
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M96/49
, 1996
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-49.pdf
BibTeX citation:
@techreport{Wessels:M96/49, Author= {Wessels, M.}, Title= {The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source}, Year= {1996}, Month= {Sep}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html}, Number= {UCB/ERL M96/49}, }
EndNote citation:
%0 Report %A Wessels, M. %T The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/49 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html %F Wessels:M96/49