The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source

M. Wessels

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/49
September 1996

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-49.pdf


BibTeX citation:

@techreport{Wessels:M96/49,
    Author = {Wessels, M.},
    Title = {The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1996},
    Month = {Sep},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html},
    Number = {UCB/ERL M96/49}
}

EndNote citation:

%0 Report
%A Wessels, M.
%T The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/49
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html
%F Wessels:M96/49