The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source
M. Wessels
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M96/49
1996
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-49.pdf
BibTeX citation:
@techreport{Wessels:M96/49,
Author= {Wessels, M.},
Title= {The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source},
Year= {1996},
Month= {Sep},
Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html},
Number= {UCB/ERL M96/49},
}
EndNote citation:
%0 Report %A Wessels, M. %T The Effect of Plasma Loading on Impedance as Observed in an Inductively Coupled Plasma Source %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/49 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3061.html %F Wessels:M96/49