Y.T. Lee
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/63
October 1996
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-63.pdf
BibTeX citation:
@techreport{Lee:M96/63, Author = {Lee, Y.T.}, Title = {Modeling of Cl_2-He Polysilicon Etching with a Global Model for High Pressure Electronegative Radio-Frequency Discharges}, Institution = {EECS Department, University of California, Berkeley}, Year = {1996}, Month = {Oct}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3100.html}, Number = {UCB/ERL M96/63} }
EndNote citation:
%0 Report %A Lee, Y.T. %T Modeling of Cl_2-He Polysilicon Etching with a Global Model for High Pressure Electronegative Radio-Frequency Discharges %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/63 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3100.html %F Lee:M96/63