Y.T. Lee

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M96/63

, 1996

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-63.pdf

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BibTeX citation:

@techreport{Lee:M96/63,
    Author= {Lee, Y.T.},
    Title= {Modeling of Cl_2-He Polysilicon Etching with a Global Model for High Pressure Electronegative Radio-Frequency Discharges},
    Year= {1996},
    Month= {Oct},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3100.html},
    Number= {UCB/ERL M96/63},
}

EndNote citation:

%0 Report
%A Lee, Y.T. 
%T Modeling of Cl_2-He Polysilicon Etching with a Global Model for High Pressure Electronegative Radio-Frequency Discharges
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/63
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3100.html
%F Lee:M96/63