Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging
B.P. Linder
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M96/98
, 1996
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/ERL-96-98.pdf
BibTeX citation:
@techreport{Linder:M96/98, Author= {Linder, B.P.}, Title= {Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging}, Year= {1996}, Month= {Dec}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html}, Number= {UCB/ERL M96/98}, }
EndNote citation:
%0 Report %A Linder, B.P. %T Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/98 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html %F Linder:M96/98