I. Lee

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M97/51

, 1997

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-51.pdf

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BibTeX citation:

@techreport{Lee:M97/51,
    Author= {Lee, I.},
    Title= {Understanding the Role of Mask and Resist in Line-End Shortening with Simulation},
    Year= {1997},
    Month= {Jul},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3267.html},
    Number= {UCB/ERL M97/51},
}

EndNote citation:

%0 Report
%A Lee, I. 
%T Understanding the Role of Mask and Resist in Line-End Shortening with Simulation
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/51
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3267.html
%F Lee:M97/51