OES-Based Sensing for Plasma Processing in IC Manufacturing
Roa Wen Chen
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M97/90
, 1997
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-90.pdf
Advisors: Costas J. Spanos
BibTeX citation:
@phdthesis{Chen:M97/90, Author= {Chen, Roa Wen}, Title= {OES-Based Sensing for Plasma Processing in IC Manufacturing}, School= {EECS Department, University of California, Berkeley}, Year= {1997}, Month= {Dec}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html}, Number= {UCB/ERL M97/90}, }
EndNote citation:
%0 Thesis %A Chen, Roa Wen %T OES-Based Sensing for Plasma Processing in IC Manufacturing %I EECS Department, University of California, Berkeley %D 1997 %@ UCB/ERL M97/90 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html %F Chen:M97/90