In Situ Metrology for Deep Ultraviolet Photolithography Control

N. Jakatdar

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M97/98

1997

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/Archive/ERL-97-98.pdf

BibTeX citation:

@techreport{Jakatdar:M97/98,
    Author= {Jakatdar, N.},
    Title= {In Situ Metrology for Deep Ultraviolet Photolithography Control},
    Year= {1997},
    Month= {Dec},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html},
    Number= {UCB/ERL M97/98},
}

EndNote citation:

%0 Report
%A Jakatdar, N. 
%T In Situ Metrology for Deep Ultraviolet Photolithography Control
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/98
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html
%F Jakatdar:M97/98