In Situ Metrology for Deep Ultraviolet Photolithography Control
N. Jakatdar
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M97/98
, 1997
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-98.pdf
BibTeX citation:
@techreport{Jakatdar:M97/98, Author= {Jakatdar, N.}, Title= {In Situ Metrology for Deep Ultraviolet Photolithography Control}, Year= {1997}, Month= {Dec}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html}, Number= {UCB/ERL M97/98}, }
EndNote citation:
%0 Report %A Jakatdar, N. %T In Situ Metrology for Deep Ultraviolet Photolithography Control %I EECS Department, University of California, Berkeley %D 1997 %@ UCB/ERL M97/98 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html %F Jakatdar:M97/98