In Situ Metrology for Deep Ultraviolet Photolithography Control

N. Jakatdar

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/98
December 1997

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-98.pdf

BibTeX citation:

@techreport{Jakatdar:M97/98,
    Author = {Jakatdar, N.},
    Title = {In Situ Metrology for Deep Ultraviolet Photolithography Control},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1997},
    Month = {Dec},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html},
    Number = {UCB/ERL M97/98}
}

EndNote citation:

%0 Report
%A Jakatdar, N.
%T In Situ Metrology for Deep Ultraviolet Photolithography Control
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/98
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3370.html
%F Jakatdar:M97/98