Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography
M. Claassen
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M98/59
, 1998
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/ERL-98-59.pdf
BibTeX citation:
@techreport{Claassen:M98/59, Author= {Claassen, M.}, Title= {Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography}, Year= {1998}, Month= {Oct}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/3515.html}, Number= {UCB/ERL M98/59}, }
EndNote citation:
%0 Report %A Claassen, M. %T Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography %I EECS Department, University of California, Berkeley %D 1998 %@ UCB/ERL M98/59 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/3515.html %F Claassen:M98/59