Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography

M. Claassen

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M98/59
October 1998

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/ERL-98-59.pdf

BibTeX citation:

@techreport{Claassen:M98/59,
    Author = {Claassen, M.},
    Title = {Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1998},
    Month = {Oct},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/3515.html},
    Number = {UCB/ERL M98/59}
}

EndNote citation:

%0 Report
%A Claassen, M.
%T Study on Real-Time Develop Rate Monitors for Control of Deep Ultraviolet Lithography
%I EECS Department, University of California, Berkeley
%D 1998
%@ UCB/ERL M98/59
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1998/3515.html
%F Claassen:M98/59