Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing

Barry P. Linder

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/8
February 1999

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-8.pdf

Advisor: Nathan W. Cheung

BibTeX citation:

@phdthesis{Linder:M99/8,
    Author = {Linder, Barry P.},
    Title = {Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing},
    School = {EECS Department, University of California, Berkeley},
    Year = {1999},
    Month = {Feb},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html},
    Number = {UCB/ERL M99/8}
}

EndNote citation:

%0 Thesis
%A Linder, Barry P.
%T Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/8
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html
%F Linder:M99/8