Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing
Barry P. Linder
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M99/8
, 1999
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-8.pdf
Advisors: Nathan W. Cheung
BibTeX citation:
@phdthesis{Linder:M99/8, Author= {Linder, Barry P.}, Title= {Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing}, School= {EECS Department, University of California, Berkeley}, Year= {1999}, Month= {Feb}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html}, Number= {UCB/ERL M99/8}, }
EndNote citation:
%0 Thesis %A Linder, Barry P. %T Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing %I EECS Department, University of California, Berkeley %D 1999 %@ UCB/ERL M99/8 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html %F Linder:M99/8