Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation
E. Croffie
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M99/26
, 1999
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-26.pdf
BibTeX citation:
@techreport{Croffie:M99/26, Author= {Croffie, E.}, Title= {Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation}, Year= {1999}, Month= {May}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html}, Number= {UCB/ERL M99/26}, }
EndNote citation:
%0 Report %A Croffie, E. %T Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation %I EECS Department, University of California, Berkeley %D 1999 %@ UCB/ERL M99/26 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html %F Croffie:M99/26