Xinhui Niu

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M99/27

, 1999

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-27.pdf

Advisors: Costas J. Spanos

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BibTeX citation:

@phdthesis{Niu:M99/27,
    Author= {Niu, Xinhui},
    Title= {An Integrated System of Optical Metrology for Deep Submicron Lithography},
    School= {EECS Department, University of California, Berkeley},
    Year= {1999},
    Month= {Apr},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html},
    Number= {UCB/ERL M99/27},
}

EndNote citation:

%0 Thesis
%A Niu, Xinhui 
%T An Integrated System of Optical Metrology for Deep Submicron Lithography
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/27
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html
%F Niu:M99/27