An Integrated System of Optical Metrology for Deep Submicron Lithography

Xinhui Niu

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/27
April 1999

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-27.pdf

Advisor: Costas J. Spanos

BibTeX citation:

@phdthesis{Niu:M99/27,
    Author = {Niu, Xinhui},
    Title = {An Integrated System of Optical Metrology for Deep Submicron Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {1999},
    Month = {Apr},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html},
    Number = {UCB/ERL M99/27}
}

EndNote citation:

%0 Thesis
%A Niu, Xinhui
%T An Integrated System of Optical Metrology for Deep Submicron Lithography
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/27
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html
%F Niu:M99/27