Deep Submicron Photoresist Modeling and Parameter Extraction

J. Bao

EECS Department, University of California, Berkeley

Technical Report No. UCB/ERL M00/28

2000

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http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/Archive/ERL-00-28.pdf

BibTeX citation:

@techreport{Bao:M00/28,
    Author= {Bao, J.},
    Title= {Deep Submicron Photoresist Modeling and Parameter Extraction},
    Year= {2000},
    Month= {May},
    Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html},
    Number= {UCB/ERL M00/28},
}

EndNote citation:

%0 Report
%A Bao, J. 
%T Deep Submicron Photoresist Modeling and Parameter Extraction
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/28
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html
%F Bao:M00/28