Deep Submicron Photoresist Modeling and Parameter Extraction
J. Bao
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M00/28
2000
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-28.pdf
BibTeX citation:
@techreport{Bao:M00/28,
Author= {Bao, J.},
Title= {Deep Submicron Photoresist Modeling and Parameter Extraction},
Year= {2000},
Month= {May},
Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html},
Number= {UCB/ERL M00/28},
}
EndNote citation:
%0 Report %A Bao, J. %T Deep Submicron Photoresist Modeling and Parameter Extraction %I EECS Department, University of California, Berkeley %D 2000 %@ UCB/ERL M00/28 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html %F Bao:M00/28