Deep Submicron Photoresist Modeling and Parameter Extraction
J. Bao
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M00/28
, 2000
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-28.pdf
BibTeX citation:
@techreport{Bao:M00/28, Author= {Bao, J.}, Title= {Deep Submicron Photoresist Modeling and Parameter Extraction}, Year= {2000}, Month= {May}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html}, Number= {UCB/ERL M00/28}, }
EndNote citation:
%0 Report %A Bao, J. %T Deep Submicron Photoresist Modeling and Parameter Extraction %I EECS Department, University of California, Berkeley %D 2000 %@ UCB/ERL M00/28 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html %F Bao:M00/28