Deep Submicron Photoresist Modeling and Parameter Extraction

J. Bao

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/28
May 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-28.pdf

BibTeX citation:

@techreport{Bao:M00/28,
    Author = {Bao, J.},
    Title = {Deep Submicron Photoresist Modeling and Parameter Extraction},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html},
    Number = {UCB/ERL M00/28}
}

EndNote citation:

%0 Report
%A Bao, J.
%T Deep Submicron Photoresist Modeling and Parameter Extraction
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/28
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3845.html
%F Bao:M00/28