Kinetics of Photoresist Etching in a Large Area Plasma Source (LAPS)

K. Takechi and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/40
August 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-40.pdf


BibTeX citation:

@techreport{Takechi:M00/40,
    Author = {Takechi, K. and Lieberman, Michael A.},
    Title = {Kinetics of Photoresist Etching in a Large Area Plasma Source (LAPS)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {Aug},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3867.html},
    Number = {UCB/ERL M00/40}
}

EndNote citation:

%0 Report
%A Takechi, K.
%A Lieberman, Michael A.
%T Kinetics of Photoresist Etching in a Large Area Plasma Source (LAPS)
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/40
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3867.html
%F Takechi:M00/40