Spatially Resolved Optical Emission Spectroscopy for Plasma Etching
J-W. Lee
EECS Department, University of California, Berkeley
Technical Report No. UCB/ERL M00/49
, 2000
http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-49.pdf
BibTeX citation:
@techreport{Lee:M00/49, Author= {Lee, J-W.}, Title= {Spatially Resolved Optical Emission Spectroscopy for Plasma Etching}, Year= {2000}, Month= {Sep}, Url= {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3888.html}, Number= {UCB/ERL M00/49}, }
EndNote citation:
%0 Report %A Lee, J-W. %T Spatially Resolved Optical Emission Spectroscopy for Plasma Etching %I EECS Department, University of California, Berkeley %D 2000 %@ UCB/ERL M00/49 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3888.html %F Lee:M00/49